作者：黄瑾¹, 潘丹梅¹, 郑清洪²

作者单位：1. 中国科学院福建物质结构研究所测试中心, 福建 福州 350002;
2. 福建农林大学材料工程学院, 福建 福州 350002

关键词：辉光放电质谱法;AZO靶材;磁控溅射;深度分析

摘要：

利用辉光放电质谱仪（GDMS）对铝掺杂的氧化锌（AZO）靶材中的常微量元素及其深度分布进行分析。首先考察AZO样品中的元素和Ar、H、O、N等气体元素形成的多原子离子干扰。其次利用GDMS和台阶仪对已经进行磁控溅射过的AZO靶材表面进行深度剖析，考察靶材上的主要污染元素随深度的纵向分布，最后利用GDMS对预溅射完后的AZO靶材内部杂质元素进行质谱分析。利用XPS进行验证，两种方法测试得到的Zn和Al的含量相近。分析结果表明GDMS是分析AZO等半导体靶材的有效方法，该方法可以对靶材造成的污染进行预判，避免溅射过程中造成的污染。

Impurities concentration detection and depth profile in AZO target by glow discharge mass spectrometry

HUANG Jin¹, PAN Danmei¹, ZHENG Qinghong²

1. Test Center, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou 350002, China;
2. College of Materials Engineering, Fujian Agriculture and Forestry University, Fuzhou 350002, China

Abstract: In this paper, glow discharge mass spectrometry (GDMS) is used for the analysis of major and trace elements in alumina-doped zinc oxide (AZO) target and its depth profiling. First of all, the polyatomic ion interference of elements in AZO sample and Ar, H, O, N and other gas elements are thoroughly examined. Then, making an in-depth profile analysis of AZO target surface after magnetron sputtering by GDMS and step profiler, on which the longitudinal distribution of major pollution elements is also examined. Lastly, making mass spectrographic analysis of AZO target impurities after pre-sputtering by GDMS. Results of verification test by X-ray photoelectron spectroscopy(XPS) indicates that Zn and Al contents in the two methods are similar, and that GDMS is an effective method to analyze AZO and other semiconductor targets. Hence, pollution caused by AZO target in the process of sputtering can be effectively predicted and avoided.

Keywords: glow discharge mass spectrometry;AZO target;magnetron sputtering;depth profile

2017, 43(4): 33-37  收稿日期: 2016-08-10;收到修改稿日期: 2016-10-12

基金项目: 2014年国家自然科学基金青年项目（61306065）；2015年福建省自然科学基金项目（2015J05133）

作者简介: 黄瑾(1983-),女,福建福州市人,工程师,主要从事质谱分析检测工作。

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